(Sr.) Process Integration Engineer - Dry Etching GaN (m/f/d)

• Masters' degree in Semiconductor Device Physics or Semiconductor Technology and/or Microelectronics
• Minimum 3 years of relevant experience depending on educational credentials
• Knowledge of semiconductor devices and industrial semiconductor technology
• Hands on experience in wafer fab process module developments on lithography equipment
• Team player with a strong drive to achieve success
• Fluency in German, good level of English
• Good communication skills, both verbal and written

We offer

Why work for us?

• Flexible working hours and possibility of overtime reduction to maintain a Work-Life-Balance
• Unlimited employment contract with a competitive salary and supplementary voluntary employee benefits
• A wide variety of training courses and career development options
• Numerous further benefits, such as retirement provisions, travel allowance for the public transport ticket, company events, sports and leisure activities, employee discounts and even more

Talent acquisition based on Nexperia vacancies is not appreciated. Nexperia job adverts are Nexperia copyright © material and the word Nexperia® is a registered trademark.

D&I Statement

As an equal-opportunity employer, Nexperia values diversity not just because it is the right thing to do but because diverse teams perform better. We are dedicated to being inclusive, and a proof point of this dedication is that we were the main partner of the very first Dutch Paralympic Team NL House during the Paris 2024 Paralympic Games. Our recruitment process is inclusive and accessible to all, and we consider all applicants fairly, as well as providing a safe work environment and reasonable adjustments where requested.

In addition, we offer our colleagues the possibility to join employee resource groups such as the Pride Network Group or global and local Women's groups. Nexperia is committed to increasing women in management positions to 30% by 2030.

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Source: Statistisches Bundesamt (Destatis), table; dl-de/by-2-0; StarIn's calculation